Deposition of carbon nanotubes on chemically modified silicon surfaces

•Ralph Krupke1, Sharali Malik1, Oliver Hampe1, Heiko Weber1, Manfred Kappes2 und Hilbert von Löhneysen3
1Forschungszentrum Karlsruhe, Institut für Nanotechnologie, Postfach 3640, 76021 Karlsruhe
2Universität Karlsruhe, Institut für Physikalische Chemie II, Kaiserstr. 12, 76128 Karlsruhe
3Forschungszentrum Karlsruhe, Institut für Festkörperphysik und Universität Karlsruhe, Physikalisches Institut, Postfach 3640, 76021 Karlsruhe

We use the difference between wetting of aminoalkyl-terminated- and methyl-terminated silicon surfaces for selective deposition of carbon nanotubes from a dimethylformamide suspension. The method first described by Liu et al.[1] has the potential for highly parallel nanotube self-assembling on prepatterned electrodes. Prior to 3-aminopropyltriethoxysilane (APTES) deposition, trimethylsilyl has to be removed locally by electron beam or AFM lithography. We report on 1) the effectiveness of the electron beam lithography as a function of energy and dose deduced from contact-angle measurements, 2) the impact of sonication of the nanotube suspension on deposition, 3) aging effects in the APTES/chloroform solution.