•Ralph Krupke¹, Sharali Malik¹, Oliver Hampe¹, Heiko Weber¹, Manfred Kappes² und Hilbert von Löhneysen^3
1Forschungszentrum Karlsruhe, Institut für Nanotechnologie, Postfach 3640, 76021 Karlsruhe
²Universität Karlsruhe, Institut für Physikalische Chemie II, Kaiserstr. 12, 76128 Karlsruhe
³Forschungszentrum Karlsruhe, Institut für Festkörperphysik und Universität Karlsruhe, Physikalisches Institut, Postfach 3640, 76021 Karlsruhe

We use the difference between wetting of aminoalkyl-terminated- and methyl-terminated silicon surfaces for selective deposition of carbon nanotubes from a dimethylformamide suspension. The method first described by Liu et al.[1] has the potential for highly parallel nanotube self-assembling on prepatterned electrodes. Prior to 3-aminopropyltriethoxysilane (APTES) deposition, trimethylsilyl has to be removed locally by electron beam or AFM lithography. We report on 1) the effectiveness of the electron beam lithography as a function of energy and dose deduced from contact-angle measurements, 2) the impact of sonication of the nanotube suspension on deposition, 3) aging effects in the APTES/chloroform solution.