PSE 2008 Garmisch-Partenkirchen, 15.09-19.09.2008

Topic 3: Films and Coatings

3.1 Protective and tribological coatings Nano Films

3.1.1 Tribological coatingsNanocomposite Films

Fabrication Deposition and characterization of hard coatings in the material system
V-Al-N by reactive magnetron sputter deposition

S. Kolozsvári^a, P. Pesch^a, C. Ziebert^b, S. Ulrich^b

^aTZO – Technologiezentrum für Oberflächentechnik Rheinbreitbach GmbH, Maarweg 30, 53619 Rheinbreitbach, Germany

^bForschungszentrum Karlsruhe, Institut für Materialforschung I, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Binary and ternary hard coatings in the system V-Al-N (VN, AlN and VAlN) were deposited by reactive dc and r.f.-magnetron sputtering in an Ar/N gas mixture from a V target and/or Al target. For each experiment, Si (100) substrates and polished 1.2379 steel substrates made of 1.2379 were placed on the rotating substrate table. Depositing VN coatings were deposited at a constant, the Ar gas flow was kept constant at of 250mln[KI1] , while the bias voltage on applied to the substrate table was systematically varied between -80 and -200V. The influence of this variation on the mechanical properties was examined. Fabricating For the deposition of AlN and VAlN coatings, the bias voltage, the Ar:N ratio and the total deposition gas pressure were varied. The chemical composition of the obtained coatings was determined by electron microprobe analysis and the crystal structure of the films was characterized by X-ray diffraction. The mechanical properties hardness and reduced elastic modulus have been investigated by microindentation and the critical load of failure by scratch test. The sample surface roughness of the as-deposited samples after deposition was examined as a function of the initial substrate surface roughness. It was possible to achieve a large variation of the hardness in the range between 10 and 30 GPa and in the reduced elastic modulus in the range between 700HV_0.0005 and 3100 HV_0.0005. Finally, the plant-specific conditions for the formation of large-area VN, AIN and VAlN nanofilms in industrial-size coating facilities are described in terms of process engineering.

Vorschläge für Referees:

1. Dr., Joerg, Patscheider, Thin Films Department, Laboratory for Nanoscale Materials Science (EMPA), 193
2. Prof. Dr., Jochen, Schneider, Materials Chemistry, Lehrstuhl für Werkstoffchemie, Aachen D-52056
3. Prof. Dr., Witold, Gulbinski, The Technical University of Koszalin, Faculty of Mechanical Engineering, 75-620 Koszalin

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[KI1]Was bedeutet mln?